Comparing Isoelectric Point and Surface Composition of Plasma Modified Native and Deposited SiO2 Films Using Contact Angle Titrations and X-ray Photoelectron Spectroscopy.

التفاصيل البيبلوغرافية
العنوان:	Comparing Isoelectric Point and Surface Composition of Plasma Modified Native and Deposited SiO2 Films Using Contact Angle Titrations and X-ray Photoelectron Spectroscopy.
المؤلفون:	Trevino, Kristina J., Shearer, Jeffrey C., Tompkins, Brendan D., Fisher, Ellen R.
المصدر:	Plasma Processes & Polymers; 10/21/2011, Vol. 8 Issue 10, p951-964, 14p
قاعدة البيانات:	Complementary Index

الوصف
تدمد:	16128850
DOI:	10.1002/ppap.201100010