دورية أكاديمية
Fundamental aspects of electron beam lithography. I. Depth-dose response of polymeric electron beam resists.
| العنوان: | Fundamental aspects of electron beam lithography. I. Depth-dose response of polymeric electron beam resists. |
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| المؤلفون: | Heidenreich, R. D., Thompson, L. F., Feit, E. D., Melliar-Smith, C. M. |
| المصدر: | Journal of Applied Physics; Sep1973, Vol. 44 Issue 9, p4039-4047, 9p |
| قاعدة البيانات: | Complementary Index |
Find this article in full text from Scitation. | تدمد: | 00218979 |
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| DOI: | 10.1063/1.1662892 |