دورية أكاديمية
Oxygen plasma etching for resist stripping and multilayer lithography.
| العنوان: | Oxygen plasma etching for resist stripping and multilayer lithography. |
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| المؤلفون: | Hartney, M. A., Hess, D. W., Soane, D. S. |
| المصدر: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1989, Vol. 7 Issue 1, p1-13, 13p |
| قاعدة البيانات: | Complementary Index |
Find this article in full text from Scitation. | تدمد: | 0734211X |
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| DOI: | 10.1116/1.584440 |