دورية أكاديمية
In situ wafer temperature monitoring of silicon etching using diffuse reflectance spectroscopy.
| العنوان: | In situ wafer temperature monitoring of silicon etching using diffuse reflectance spectroscopy. |
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| المؤلفون: | Booth, J. L., Beard, B. T., Stevens, J. E., Blain, M. G., Meisenheimer, T. L. |
| المصدر: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1996, Vol. 14 Issue 4, p2356-2360, 5p |
| قاعدة البيانات: | Complementary Index |
Find this article in full text from Scitation. | تدمد: | 07342101 |
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| DOI: | 10.1116/1.580022 |