التفاصيل البيبلوغرافية
| العنوان: |
Characterization of a radio-frequency discharge used for downstream plasma oxidation of Si. |
| المؤلفون: |
Cook, J. G., LeBrun, L., Zhongming, Li, Ogryzlo, E. A. |
| المصدر: |
Journal of Applied Physics; 2/15/1995, Vol. 77 Issue 4, p1690, 6p, 1 Diagram, 1 Chart, 5 Graphs |
| مصطلحات موضوعية: |
RADIO frequency discharges, SILICON, SILICA |
| مستخلص: |
Focuses on a study on the characterization of a radio-frequency discharge used for downstream plasma oxidation of silicon. Introduction to high-quality silicon dioxide films; Experimental details; Results and discussion. |
| قاعدة البيانات: |
Complementary Index |
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