دورية أكاديمية

Erratum: 'Work function tuning and improved gate dielectric reliability with multilayer graphene as a gate electrode for metal oxide semiconductor field effect device applications' [Appl. Phys. Lett. 100, 233506 (2012)].

التفاصيل البيبلوغرافية
العنوان: Erratum: 'Work function tuning and improved gate dielectric reliability with multilayer graphene as a gate electrode for metal oxide semiconductor field effect device applications' [Appl. Phys. Lett. 100, 233506 (2012)].
المؤلفون: Misra, Abhishek, Waikar, Mayur, Gour, Amit, Kalita, Hemen, Khare, Manali, Aslam, Mohammed, Kottantharayil, Anil
المصدر: Applied Physics Letters; 9/17/2012, Vol. 101 Issue 12, p129902, 1p
مصطلحات موضوعية: METAL oxide semiconductors
مستخلص: A correction to the article "Work function tuning and improved gate dielectric reliability with multilayer graphene as a gate electrode for metal oxide semiconductor field affect device applications" that was published in September 2012 is presented.
قاعدة البيانات: Complementary Index
الوصف
تدمد:00036951
DOI:10.1063/1.4754145