دورية أكاديمية
Area-Selective Atomic Layer Deposition of TiN, TiO2, and HfO2 on Silicon Nitride with inhibition on Amorphous Carbon.
| العنوان: | Area-Selective Atomic Layer Deposition of TiN, TiO |
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| المؤلفون: | Eric Stevens, Yoann Tomczak, Chan, B. T., Altamirano Sanchez, Efrain, Parsons, Gregory N., Delabie, Annelies |
| المصدر: | Chemistry of Materials; 5/22/2018, Vol. 30 Issue 10, p3223-3232, 10p |
| قاعدة البيانات: | Supplemental Index |
Find this issue from the American Chemical Society | تدمد: | 08974756 |
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| DOI: | 10.1021/acs.chemmater.8b00017 |