Single Chemistry Cleaning Solution for Advanced Wafer Cleaning

التفاصيل البيبلوغرافية
العنوان: Single Chemistry Cleaning Solution for Advanced Wafer Cleaning
المؤلفون: Vos, Rita, Doll, O., Fester, A., Kolbesen, Bernd O., Lux, Marcel, Kenis, Karine, Onsia, Bart, Degendt, S., Schellkes, E., Hatcher, Z., Mertens, Paul W., Heyns, Marc M.
المصدر: Diffusion and Defect Data Part B: Solid State Phenomena; January 2001, Vol. 76 Issue: 1 p119-122, 4p
مستخلص: Not Available
قاعدة البيانات: Supplemental Index
الوصف
تدمد:10120394
DOI:10.4028/www.scientific.net/SSP.76-77.119