دورية
Deposition of (Ti,Al)N thin films by organometallic chemical vapor deposition: thermodynamic predictions and experimental results
| العنوان: | Deposition of (Ti,Al)N thin films by organometallic chemical vapor deposition: thermodynamic predictions and experimental results |
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| المؤلفون: | Gilles, S., Bourhila, N., Ikeda, S., Bernard, C., Madar, R. |
| المصدر: | Surface and Coatings Technology; 1997, Vol. 94 Issue: 1 p285-290, 6p |
| قاعدة البيانات: | Supplemental Index |
Full Text Finder | تدمد: | 02578972 |
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| DOI: | 10.1016/S0257-8972(97)00439-8 |