دورية
Atomistic modeling of chemical vapor deposition: silicon nitride CVD from dichlorosilane and ammonia
| العنوان: | Atomistic modeling of chemical vapor deposition: silicon nitride CVD from dichlorosilane and ammonia |
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| المؤلفون: | Bagatur`yants, A. A., Novoselov, K. P., Safonov, A. A., Savchenko, L. L., Cole, J. V., Korkin, A. A. |
| المصدر: | Materials Science in Semiconductor Processing; 2000, Vol. 3 Issue: 1 p23-29, 7p |
| قاعدة البيانات: | Supplemental Index |
Full Text Finder | تدمد: | 13698001 |
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| DOI: | 10.1016/S1369-8001(00)00006-8 |