دورية
Performance Control of Positive-Working Electron Beam Resists by Copolymerization and Blending
| العنوان: | Performance Control of Positive-Working Electron Beam Resists by Copolymerization and Blending |
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| المؤلفون: | Sugita, Kazuyuki, Ueno, Nobuo, Funabashi, Michimasa, Yoshida, Yasuyuki, Doi, Yasunori, Nagata, Shiro, Sasaki, Shigeru |
| المصدر: | Polymer Journal; October 1985, Vol. 17 Issue: 10 p1091-1103, 13p |
| مستخلص: | EB exposure characteristics, such as sensitivity and contrast, and durability against oxygen plasma were measured with linear copolymers and polymer blends of various composition, which were prepared from a-methylstyrene [MSt] and methyl methacrylate [MMA]. Moreover, new developers were examined for these polymers, since sensitivity and contrast of the positive-working resist system depend largely on dissolution kinetics concerning each combination of the resist polymer and the developer. Methyl isobutyl ketone and isoamyl acetate were used as the developer, though they were developers of excessive dissolving power for PMMA and /or PMSt homopolymers. The copolymers containing 30—50 mol% of MSt were as durable as PMSt homopolymer against oxygen plasma and had higher contrast than PMMA. The blend had dryetching durability as large as the copolymer of the same composition, and showed considerably high contrast, while the copolymer had higher sensitivity than the blend. The blends containing 21 mol% or less of MSt monomer units were much more durable than PMMA and of contrast as high as PMMA, but less sensitive than PMMA. |
| قاعدة البيانات: | Supplemental Index |
Full Text Finder | تدمد: | 00323896 13490540 |
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| DOI: | 10.1295/polymj.17.1091 |