دورية
The application of advanced pulsed plasma in Fin etch loading improvement
| العنوان: | The application of advanced pulsed plasma in Fin etch loading improvement |
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| المؤلفون: | Engelmann, Sebastian U., Wise, Rich S., Xiao, Fang-Yuan, Han, Qiu-Hua, Zhang, Hai-Yang |
| المصدر: | Proceedings of SPIE; April 2017, Vol. 10149 Issue: 1 p101490Z-101490Z-4, 913415p |
| قاعدة البيانات: | Supplemental Index |
| تدمد: | 0277786X |
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| DOI: | 10.1117/12.2266539 |