التفاصيل البيبلوغرافية
| العنوان: |
Outlook for high-NA EUV patterning: a holistic patterning approach to address upcoming challenges |
| المؤلفون: |
Bannister, Julie, Mohanty, Nihar, Raley, Angélique, Huli, Lior, Grzeskowiak, Steven, Lutker-Lee, Katie, Krawicz, Alexandra, Feurprier, Yannick, Liu, Eric, Kato, Kanzo, Nafus, Kathleen, Dauendorffer, Arnaud, Bae, Nayoung, LaRose, Josh, Metz, Andrew, Hetzer, Dave, Honda, Masanobu, Nishizuka, Tetsuya, Ko, Akiteru, Okada, Soichiro, Ido, Yasuyuki, Onitsuka, Tomoya, Kawakami, Shinichiro, Fujimoto, Seiji, Shimura, Satoru, Dinh, Cong Que, Muramatsu, Makoto, Biolsi, Peter, Mochiki, Hiromasa, Nagahara, Seiji |
| المصدر: |
Proceedings of SPIE; May 2022, Vol. 12056 Issue: 1 p120560A-120560A-13, 11935454p |
| قاعدة البيانات: |
Supplemental Index |
