High-power LPP-EUV source for semiconductor HVM: lithography and other applications

التفاصيل البيبلوغرافية
العنوان: High-power LPP-EUV source for semiconductor HVM: lithography and other applications
المؤلفون: Itani, Toshiro, Naulleau, Patrick P., Gargini, Paolo A., Ronse, Kurt G., Mizoguchi, Hakaru, Nakarai, Hiroaki, Usami, Yasutsugu, Kakizaki, Kouji, Fujimoto, Junichi, Saitou, Takashi
المصدر: Proceedings of SPIE; December 2022, Vol. 12292 Issue: 1 p122920X-122920X-6, 1106287p
قاعدة البيانات: Supplemental Index
الوصف
تدمد:0277786X
DOI:10.1117/12.2657787