EUV mask patterning process to enable opaque SRAFs for bright field EUV mask imaging

التفاصيل البيبلوغرافية
العنوان: EUV mask patterning process to enable opaque SRAFs for bright field EUV mask imaging
المؤلفون: Liang, Ted, Kim, Seong-Sue, Green, Michael, Halle, Scott, Ramadan, Mohamed, Lallement, Romain, Kamberian, Henry, Burkhardt, Martin, Beineke, Jinju, Rankin, Jed, Progler, Chris, McDermott, Steven
المصدر: Proceedings of SPIE; November 2023, Vol. 12751 Issue: 1 p127510M-127510M-9, 1147600p
قاعدة البيانات: Supplemental Index
الوصف
تدمد:0277786X
DOI:10.1117/12.2689665