Roughness improvement by post-development treatment of CAR for high-NA EUV lithography

التفاصيل البيبلوغرافية
العنوان: Roughness improvement by post-development treatment of CAR for high-NA EUV lithography
المؤلفون: Guerrero, Douglas, Amblard, Gilles R., Cho, Kayoko, Tomori, Hikari, Dinh, Cong Que, Nagahara, Seiji, Hara, Arisa, Fujimoto, Seiji, Dauendorffer, Arnaud, Huli, Lior, Kato, Kanzo, Antonovich, Nathan, Muramatsu, Makoto
المصدر: Proceedings of SPIE; April 2024, Vol. 12957 Issue: 1 p129571Q-129571Q-9, 1166149p
قاعدة البيانات: Supplemental Index
الوصف
تدمد:0277786X
DOI:10.1117/12.3010231