Detection in the ppm range and high-resolution depth profiling with the new SNMS instrument INA-X
العنوان: | Detection in the ppm range and high-resolution depth profiling with the new SNMS instrument INA-X |
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المؤلفون: | Hans Oechsner, J. Jorzick, J. Lösch, Michael Kopnarski |
المصدر: | Applied Physics A: Materials Science & Processing. 78:655-658 |
بيانات النشر: | Springer Science and Business Media LLC, 2004. |
سنة النشر: | 2004 |
مصطلحات موضوعية: | Chemistry, business.industry, Instrumentation, General Chemistry, Micrometre, Optics, Sputtering, Ionization, General Materials Science, Vacuum chamber, Thin film, business, Neutral particle, Current density |
الوصف: | The design and the specification of the newly developed INA-X instrument for the electron-gas version of a secondary neutral mass spectrometer (SNMS) are described. A modified plasma chamber inside a UHV vessel in combination with optimized r.f. coupling enable a high plasma density at low power input. The ionization efficiency and the current density for sample sputtering are significantly improved compared to those of previous SNMS instruments. A novel detection optics allows us to define an energy window of 1–2 eV. The secondary neutral particle flux is collected under an oblique take-off angle against the surface normal, improving the quantifiability of the obtained SNMS spectra. The variable sputtering rate can be adjusted from some nm per min up to 1–2 μm per min, depending on the operator’s need, either to obtain high depth resolution or short analysis time. Examples for depth profiling of conducting and insulating films and coatings on the nano- and micrometer scales are presented. |
تدمد: | 1432-0630 0947-8396 |
URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_________::136a129fcf3b6e4600aad2769da613fc https://doi.org/10.1007/s00339-003-2275-5 |
حقوق: | CLOSED |
رقم الأكسشن: | edsair.doi...........136a129fcf3b6e4600aad2769da613fc |
قاعدة البيانات: | OpenAIRE |
تدمد: | 14320630 09478396 |
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