Optimization of process parameters for al-doping back ground on CO gas sensing characteristics of magnetron-sputtered TiO2 sensors

التفاصيل البيبلوغرافية
العنوان: Optimization of process parameters for al-doping back ground on CO gas sensing characteristics of magnetron-sputtered TiO2 sensors
المؤلفون: M. Vanmathi, M. Senthil Kumar, M. Mohamed Ismail, G. Senguttuvan
المصدر: Materials Research Express. 6:106423
بيانات النشر: IOP Publishing, 2019.
سنة النشر: 2019
مصطلحات موضوعية: Materials science, Polymers and Plastics, business.industry, Doping, Metals and Alloys, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Biomaterials, Electrical resistivity and conductivity, Scientific method, Cavity magnetron, Optoelectronics, Sensitivity (control systems), Thin film, business
تدمد: 2053-1591
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1c3cfdc15af4f12dbcd17de69ff261bf
https://doi.org/10.1088/2053-1591/ab3a02
حقوق: OPEN
رقم الأكسشن: edsair.doi...........1c3cfdc15af4f12dbcd17de69ff261bf
قاعدة البيانات: OpenAIRE