Influence of the boundary on the interdiffusion in heterostructures

التفاصيل البيبلوغرافية
العنوان: Influence of the boundary on the interdiffusion in heterostructures
المؤلفون: A.V. Strelkov, Alexander Gaskov, Marina Rumyantseva, M.P. Belyansky
المصدر: Materials Science and Engineering: B. 26:147-149
بيانات النشر: Elsevier BV, 1994.
سنة النشر: 1994
مصطلحات موضوعية: Chalcogen, Materials science, Mechanics of Materials, Mechanical Engineering, Analytical chemistry, General Materials Science, Heterojunction, Substrate (electronics), Diffusion (business), Condensed Matter Physics, Mass spectrometry, Layer (electronics), Deposition (law)
الوصف: Interdiffusion processes in PbTe/PbTe/PbSe heterostructures were studied. Chalcogen diffusion coefficients were calculated from Se and Te concentration depth profiles recorded by the sputtered neutrals mass spectrometry technique. The deposition of the PbTe layer on the PbTe substrate reduces the rate of the chalcogen diffusion and improves the perfection of the structure.
تدمد: 0921-5107
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1d3111f0ae53b965c8605f464adb8be6
https://doi.org/10.1016/0921-5107(94)90163-5
حقوق: CLOSED
رقم الأكسشن: edsair.doi...........1d3111f0ae53b965c8605f464adb8be6
قاعدة البيانات: OpenAIRE