Deposition of Poly(acrylic acid) Films by Electrohydrodynamic Atomization in Postdischarge at Atmospheric Pressure in Air
| العنوان: | Deposition of Poly(acrylic acid) Films by Electrohydrodynamic Atomization in Postdischarge at Atmospheric Pressure in Air |
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| المؤلفون: | Michael Tatoulian, L. Tatoulian, and J. Amouroux, Farzaneh Arefi-Khonsari, Jean-Pascal Borra |
| المصدر: | Chemistry of Materials. 18:5860-5863 |
| بيانات النشر: | American Chemical Society (ACS), 2006. |
| سنة النشر: | 2006 |
| مصطلحات موضوعية: | chemistry.chemical_classification, Materials science, Atmospheric pressure, General Chemical Engineering, Carboxylic acid, General Chemistry, Dielectric barrier discharge, Contact angle, chemistry.chemical_compound, Chemical engineering, chemistry, X-ray photoelectron spectroscopy, Polymer chemistry, Materials Chemistry, Deposition (phase transition), Surface layer, Acrylic acid |
| الوصف: | Deposition of poly(acrylic acid) films has been carried out in air by electrohydrodynamic atomization in post dielectric barrier discharge at atmospheric pressure. The topmost surface layer of the coatings has been analyzed by X-ray photoelectron spectroscopy, revealing a high level of retention of the carboxylic acid functionality, up to 80%. These films are found to exhibit a low water contact angle and a high resistance to washing. |
| تدمد: | 1520-5002 0897-4756 |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_________::45aed4cb1bef7c96d5629da0d72c1cc3 https://doi.org/10.1021/cm060066e |
| رقم الأكسشن: | edsair.doi...........45aed4cb1bef7c96d5629da0d72c1cc3 |
| قاعدة البيانات: | OpenAIRE |
Find this issue from the American Chemical Society | تدمد: | 15205002 08974756 |
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