Absolute rates of vacuum-ultraviolet photochemical deposition of organic films
| العنوان: | Absolute rates of vacuum-ultraviolet photochemical deposition of organic films |
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| المؤلفون: | H. D. Marten, G. S. Arnold, T. B. Stewart, D. F. Hall |
| المصدر: | The Journal of Physical Chemistry. 93:2393-2400 |
| بيانات النشر: | American Chemical Society (ACS), 1989. |
| سنة النشر: | 1989 |
| مصطلحات موضوعية: | Vacuum ultraviolet, Photochemical deposition, Chemistry, General Engineering, Absolute (perfumery), Organic chemistry, Physical and Theoretical Chemistry, Photochemistry |
| الوصف: | Etude de la photodeposition tetramethyl tetraphenyl trisiloxane et du phtalate de bis-ethyl-2 hexyle sur l'aluminium et le platine |
| تدمد: | 1541-5740 0022-3654 |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_________::4a7c1ebed37c725db0caae160f4d20a4 https://doi.org/10.1021/j100343a037 |
| رقم الأكسشن: | edsair.doi...........4a7c1ebed37c725db0caae160f4d20a4 |
| قاعدة البيانات: | OpenAIRE |
| تدمد: | 15415740 00223654 |
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