Plasma Parameters in the Reactor with Simultaneous Magnetron Discharge and Inductive Radio-Frequency Discharge in the Presence of External Magnetic Field
| العنوان: | Plasma Parameters in the Reactor with Simultaneous Magnetron Discharge and Inductive Radio-Frequency Discharge in the Presence of External Magnetic Field |
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| المؤلفون: | G. Ya. Pavlov, Konstantin Vavilin, A. F. Aleksandrov, A. A. Airapetov, A. M. Nikonov, V. V. Odinokov, P. A. Neklyudova, V. A. Sologub, V. B. Pavlov, Elena Kralkina |
| المصدر: | Journal of Communications Technology and Electronics. 63:374-380 |
| بيانات النشر: | Pleiades Publishing Ltd, 2018. |
| سنة النشر: | 2018 |
| مصطلحات موضوعية: | 010302 applied physics, Radiation, Materials science, Plasma parameters, Ion current, Plasma, Sputter deposition, equipment and supplies, Condensed Matter Physics, 01 natural sciences, 010305 fluids & plasmas, Electronic, Optical and Magnetic Materials, Magnetic field, Helicon, Physics::Plasma Physics, 0103 physical sciences, Radio frequency, Electrical and Electronic Engineering, Atomic physics, Excitation |
| الوصف: | A plasma reactor that contains vacuum–arc and magnetron sputtering sources and radio-frequency discharge that generates high-density plasma in the presence of external magnetic field is developed, constructed, and optimized. The reactor can be used for deposition of various functional coatings with ion stimulation. The parameters of the inductive radio-frequency discharge generated in the presence of external magnetic field that serves as a source of assisting ions are optimized. It is shown that the working interval of the induction of external magnetic field corresponds to the resonant excitation of the coupled helicon and Trivelpiece–Gold waves. The effect of magnitude and configuration of magnetic field on the parameters of gas-discharge plasma and ion current in the substrate region is studied in the presence of separately and simultaneously initiated magnetron and inductive discharges. The effect of ion flux that is incident on the films in the course of growth on the structure of functional coatings is analyzed. |
| تدمد: | 1555-6557 1064-2269 |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_________::4c76293fcb4412c0f9eb50a4363c2043 https://doi.org/10.1134/s1064226918040010 |
| حقوق: | CLOSED |
| رقم الأكسشن: | edsair.doi...........4c76293fcb4412c0f9eb50a4363c2043 |
| قاعدة البيانات: | OpenAIRE |
Find this article in full text from Springer Verlag. | تدمد: | 15556557 10642269 |
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