41.4: Novel Photolithography using Near Infrared Exposure and its Photoresist including Black Photoresist
| العنوان: | 41.4: Novel Photolithography using Near Infrared Exposure and its Photoresist including Black Photoresist |
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| المؤلفون: | Akihiko Igawa, Ming-Ann Hsu |
| المصدر: | SID Symposium Digest of Technical Papers. 53:434-436 |
| بيانات النشر: | Wiley, 2022. |
| سنة النشر: | 2022 |
| مصطلحات موضوعية: | Organic Chemistry, Biochemistry |
| تدمد: | 2168-0159 0097-966X |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_________::5012aea197bd208ed3a24c5e50df9c95 https://doi.org/10.1002/sdtp.15975 |
| حقوق: | CLOSED |
| رقم الأكسشن: | edsair.doi...........5012aea197bd208ed3a24c5e50df9c95 |
| قاعدة البيانات: | OpenAIRE |
| تدمد: | 21680159 0097966X |
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