Study of fluorocarbon plasma in 60 and 100MHz capacitively coupled discharges using mass spectrometry
العنوان: | Study of fluorocarbon plasma in 60 and 100MHz capacitively coupled discharges using mass spectrometry |
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المؤلفون: | Vladimir Volynets, Sangmin Jeong, Yongho Ihm, Andrey Ushakov, Han Moon-Hyeong, Jehun Woo, Dougyong Sung |
المصدر: | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 26:1198-1207 |
بيانات النشر: | American Vacuum Society, 2008. |
سنة النشر: | 2008 |
مصطلحات موضوعية: | Fluoroform, Chemistry, Analytical chemistry, Surfaces and Interfaces, Plasma, Condensed Matter Physics, Mass spectrometry, Surfaces, Coatings and Films, Ion, chemistry.chemical_compound, Electrode, Mass spectrum, Capacitively coupled plasma, Fluorocarbon |
الوصف: | The signals of positive ions and radicals formed in the fluorocarbon plasma of the capacitively coupled plasma reactor were measured using a quadrupole mass spectrometry and optical emission actinometry. The plasma was produced at 60 and 100MHz frequencies for the same reactor configuration and gas mixtures. Experiments were performed at 25mTorr with a SiO2 wafer on the grounded electrode. Mass spectra of ions were measured in C4F8∕O2∕Ar and C4F6∕O2∕Ar gas mixtures at 500–1500W generator powers. For 60 and 100MHz discharges production of fluorocarbon ions and radicals is discussed. It was found that the production of heavy species increases with frequency. The high mass signals such as C3F3+, C2F4+, C2F5+, C3F5+, C4F7+ decrease when CHF3 is added to the gas mixture. However, the signals of CFx+ (x=1,2,3) do not change significantly. These results are compared to the results of polymer film deposition on the wafer. It was suggested to control the polymerization film formation by adding small amount of CHF3... |
تدمد: | 1520-8559 0734-2101 |
URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_________::54c1b7387a6cf2216ca09664eb53d378 https://doi.org/10.1116/1.2965812 |
رقم الأكسشن: | edsair.doi...........54c1b7387a6cf2216ca09664eb53d378 |
قاعدة البيانات: | OpenAIRE |
تدمد: | 15208559 07342101 |
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