Measurement of residual stress on TiN/Ti bilayer thin films using average X-ray strain combined with laser curvature and nanoindentation methods

التفاصيل البيبلوغرافية
العنوان: Measurement of residual stress on TiN/Ti bilayer thin films using average X-ray strain combined with laser curvature and nanoindentation methods
المؤلفون: Soichan Lei, Jia-Hong Huang, Haydn Chen
المصدر: Materials Chemistry and Physics. 199:185-192
بيانات النشر: Elsevier BV, 2017.
سنة النشر: 2017
مصطلحات موضوعية: 010302 applied physics, Materials science, Bilayer, Metallurgy, chemistry.chemical_element, 02 engineering and technology, Substrate (electronics), Adhesion, Nanoindentation, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, chemistry, Residual stress, 0103 physical sciences, General Materials Science, Composite material, Thin film, 0210 nano-technology, Tin, Layer (electronics)
الوصف: Using a pure metal interlayer to relieve residual stress and enhance adhesion of hard coatings on substrate materials has been commonly adopted in industry and extensively studied in last two decades. However, due to the difficulty in accurately measuring residual stress in individual layer of a bilayer coating, the effect of stress relief by a pure metal interlayer has not been fully understood. Recently we proposed a method combining average X-ray strain (AXS) method and nanoindentation (NI), by which the residual stress of hard coatings can be accurately measured with an uncertainty
تدمد: 0254-0584
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8117d9863775d3fbc7b0b107ad3367d0
https://doi.org/10.1016/j.matchemphys.2017.06.042
حقوق: CLOSED
رقم الأكسشن: edsair.doi...........8117d9863775d3fbc7b0b107ad3367d0
قاعدة البيانات: OpenAIRE