التفاصيل البيبلوغرافية
| العنوان: |
Low-Leakage-Current Ultra-thin SiO2 Film by Low-Temperature Neutral Beam Oxidation |
| المؤلفون: |
Chihiro Taguchi, Seiichi Fukuda, Seiji Samukawa, Kazuhiko Endo, Heiji Watanabe, Toru Ikoma |
| المصدر: |
Extended Abstracts of the 2006 International Conference on Solid State Devices and Materials. |
| بيانات النشر: |
The Japan Society of Applied Physics, 2006. |
| سنة النشر: |
2006 |
| مصطلحات موضوعية: |
Materials science, business.industry, Optoelectronics, Low leakage, Nanotechnology, Current (fluid), business, Beam (structure) |
| URL الوصول: |
https://explore.openaire.eu/search/publication?articleId=doi_________::8332d7a8f29ada55f38f6e5887d96df1
https://doi.org/10.7567/ssdm.2006.p-1-24 |
| رقم الأكسشن: |
edsair.doi...........8332d7a8f29ada55f38f6e5887d96df1 |
| قاعدة البيانات: |
OpenAIRE |
