Fabrication of 4-Inch Nano Patterned Wafer with High Uniformity by Laser Interference Lithography
| العنوان: | Fabrication of 4-Inch Nano Patterned Wafer with High Uniformity by Laser Interference Lithography |
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| المؤلفون: | H. S. Chen, Haiqiang Jia, Gen Yue, Yu Lei, Junhui Die |
| المصدر: | Chinese Physics Letters. 35:054207 |
| بيانات النشر: | IOP Publishing, 2018. |
| سنة النشر: | 2018 |
| مصطلحات موضوعية: | Materials science, Fabrication, business.industry, Scanning electron microscope, General Physics and Astronomy, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, 010309 optics, Light intensity, Interference (communication), 0103 physical sciences, Nano, Microscopy, Optoelectronics, Wafer, Laser beam quality, 0210 nano-technology, business |
| الوصف: | We report the fabrication of 4-inch nano patterned wafer by two-beam laser interference lithography and analyze the uniformity in detail. The profile of the dots array with a period of 800 nm divided into five regions is characterized by a scanning electron microscope. The average size in each region ranges from 270 nm to 320 nm, and the deviation is almost 4%, which is approaching the applicable value of 3% in the industrial process. We simulate the two-beam laser interference lithography system with MATLAB software and then calculate the distribution of light intensity around the 4 inch area. The experimental data fit very well with the calculated results. Analysis of the experimental data and calculated data indicates that laser beam quality and space filter play important roles in achieving a periodical nanoscale pattern with high uniformity and large area. There is the potential to obtain more practical applications. |
| تدمد: | 1741-3540 0256-307X |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_________::86f74798b3e8574bfa13f18e758179bf https://doi.org/10.1088/0256-307x/35/5/054207 |
| حقوق: | CLOSED |
| رقم الأكسشن: | edsair.doi...........86f74798b3e8574bfa13f18e758179bf |
| قاعدة البيانات: | OpenAIRE |
| تدمد: | 17413540 0256307X |
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