Large ferroelectric polarization of TiN/Hf0.5Zr0.5O2/TiN capacitors due to stress-induced crystallization at low thermal budget

التفاصيل البيبلوغرافية
العنوان: Large ferroelectric polarization of TiN/Hf0.5Zr0.5O2/TiN capacitors due to stress-induced crystallization at low thermal budget
المؤلفون: Si Joon Kim, Antonio T. Lucero, Dushyant Narayan, Joy S. Lee, Chadwin D. Young, Scott R. Summerfelt, Jiyoung Kim, Tamer San, Luigi Colombo, Jaidah Mohan, Jaebeom Lee, Jae-Gil Lee, Young-Chul Byun, Harrison Sejoon Kim
المصدر: Applied Physics Letters. 111:242901
بيانات النشر: AIP Publishing, 2017.
سنة النشر: 2017
مصطلحات موضوعية: 010302 applied physics, Materials science, Physics and Astronomy (miscellaneous), Annealing (metallurgy), Analytical chemistry, chemistry.chemical_element, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Ferroelectricity, law.invention, Atomic layer deposition, chemistry, law, 0103 physical sciences, Orthorhombic crystal system, Crystallization, Thin film, 0210 nano-technology, Tin, Monoclinic crystal system
الوصف: We report on atomic layer deposited Hf0.5Zr0.5O2 (HZO)-based capacitors which exhibit excellent ferroelectric (FE) characteristics featuring a large switching polarization (45 μC/cm2) and a low FE saturation voltage (∼1.5 V) as extracted from pulse write/read measurements. The large FE polarization in HZO is achieved by the formation of a non-centrosymmetric orthorhombic phase, which is enabled by the TiN top electrode (TE) having a thickness of at least 90 nm. The TiN films are deposited at room temperature and annealed at 400 °C in an inert environment for at least 1 min in a rapid thermal annealing system. The room-temperature deposited TiN TE acts as a tensile stressor on the HZO film during the annealing process. The stress-inducing TiN TE is shown to inhibit the formation of the monoclinic phase during HZO crystallization, forming an orthorhombic phase that generates a large FE polarization, even at low process temperatures.
تدمد: 1077-3118
0003-6951
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::88f0ddc7ec550054cb63e676531bffd2
https://doi.org/10.1063/1.4995619
رقم الأكسشن: edsair.doi...........88f0ddc7ec550054cb63e676531bffd2
قاعدة البيانات: OpenAIRE