Enabling medium thick gate oxide devices in 22FDX® technology for switch and high-performance amplifier application

التفاصيل البيبلوغرافية
العنوان: Enabling medium thick gate oxide devices in 22FDX® technology for switch and high-performance amplifier application
المؤلفون: Tom Herrmann, Alban Zaka, Zhixing Zhao, Binit Syamal, Wafa Arfaoui, Ruchil Jain, Ming-Cheng Chang, Sameer Jain, Shih Ni Ong
المصدر: Solid-State Electronics. 199:108512
بيانات النشر: Elsevier BV, 2023.
سنة النشر: 2023
مصطلحات موضوعية: Materials Chemistry, Electrical and Electronic Engineering, Condensed Matter Physics, Electronic, Optical and Magnetic Materials
تدمد: 0038-1101
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9080e67d663ab8098c988e921925f848
https://doi.org/10.1016/j.sse.2022.108512
حقوق: CLOSED
رقم الأكسشن: edsair.doi...........9080e67d663ab8098c988e921925f848
قاعدة البيانات: OpenAIRE