Using diode-stacked NMOS as high voltage tolerant ESD protection device for analog applications in deep submicron CMOS technologies

التفاصيل البيبلوغرافية
العنوان: Using diode-stacked NMOS as high voltage tolerant ESD protection device for analog applications in deep submicron CMOS technologies
المؤلفون: Chien-Chun Tsai, Mi-Chang Chang, Wen-De Wang, Yean-Kuen Fang, Shen Tu, Mark Chen, Chung-Hui Chen
المصدر: Solid-State Electronics. 47:865-871
بيانات النشر: Elsevier BV, 2003.
سنة النشر: 2003
مصطلحات موضوعية: Engineering, business.industry, Electrical engineering, High voltage, Hardware_PERFORMANCEANDRELIABILITY, Condensed Matter Physics, Capacitance, Electronic, Optical and Magnetic Materials, Human-body model, CMOS, Hardware_INTEGRATEDCIRCUITS, Materials Chemistry, Electrical and Electronic Engineering, business, NMOS logic, Hardware_LOGICDESIGN, Diode
الوصف: A new high voltage tolerant (HVT) electro-static discharge (ESD) design adopts one forward biased P+/N-well diode in series of one stacked NMOS, called the diode-stacked NMOS, is proposed to reduce the total capacitance and maintain the high ESD performance. The device has been implemented in 0.18 μm CMOS logic technologies and finds the measured human body model and machine-model ESD levels of the HVT pin exceed 6 kV and 550 V, respectively, while the measured input capacitance is only 250 fF.
تدمد: 0038-1101
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9caf204172cc287c87771a5906ecd9bc
https://doi.org/10.1016/s0038-1101(02)00444-6
حقوق: CLOSED
رقم الأكسشن: edsair.doi...........9caf204172cc287c87771a5906ecd9bc
قاعدة البيانات: OpenAIRE