CMOS-compatible GaN-on-Si field-effect transistors for high voltage power applications

التفاصيل البيبلوغرافية
العنوان: CMOS-compatible GaN-on-Si field-effect transistors for high voltage power applications
المؤلفون: P. C. Chen, Chang Yu-Chi, Haw-Yun Wu, C. W. Hsiung, C. B. Wu, J. L. Tsai, Alex Kalnitsky, Yu-Syuan Lin, J. L. Yu, Fu-Wei Yao, Ru-Yi Su, M. W. Tsai, Yani Lai, Man Ho Kwan, Chung-Yi Yu, Ming-Huei Lin, M.-H. Chang, Chiu Hsien-Kuang, S.-P. Wang, Lin Hsing-Chih, G. P. Lansbergen, P.-C. Liu, King-Yuen Wong, L. C. Chen, Ching-Ray Chen, Wu Cheng-Ta, F. J. Yang, H. C. Tuan
المصدر: 2014 IEEE International Electron Devices Meeting.
بيانات النشر: IEEE, 2014.
سنة النشر: 2014
مصطلحات موضوعية: Reliability (semiconductor), Materials science, business.industry, Electrical engineering, Optoelectronics, Breakdown voltage, Field-effect transistor, Wafer, High voltage, business, Epitaxy, Cmos compatible, Power (physics)
الوصف: CMOS-compatible 100/650 V enhancement-mode FETs and 650 V depletion-mode MISFETs are fabricated on 6-inch AlGaN/GaN-on-Si wafers. They show high breakdown voltage and low specific on-resistance with good wafer uniformity. The importance of epitaxial quality is figured out in a key industrial item: high-temperature-reverse-bias-stress-induced on-state drain curent degradation. Optimization of epitaxial layers shows significant improvement of device reliability.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ae1841ade0c92d1ddbbd5e8ec22c1875
https://doi.org/10.1109/iedm.2014.7047073
رقم الأكسشن: edsair.doi...........ae1841ade0c92d1ddbbd5e8ec22c1875
قاعدة البيانات: OpenAIRE