A next generation CMOS-compatible GaN-on-Si transistors for high efficiency energy systems

التفاصيل البيبلوغرافية
العنوان: A next generation CMOS-compatible GaN-on-Si transistors for high efficiency energy systems
المؤلفون: K.-Y. Roy Wong, Chen Po-Chih, C. B. Wu, Ching-Ray Chen, C. W. Hsiung, Ming-Huei Lin, F. J. Yang, Liao Yan-Jie, M. W. Tsai, Yani Lai, Chiu Hsien-Kuang, Tom Tsai, Man-Ho Kwan, Sheng-Da Liu, Burn Jeng Lin, Chang Yu-Chi, Jan-Wen You, Alex Kalnitsky, Chen-Shien Chen, M.-H. Chang, J. L. Yu, L. Y. Tsai, Yu-Syuan Lin, P.-C. Liu, Ru-Yi Su, Fu-Wei Yao, H. C. Tuan, L. C. Chen, Haw-Yun Wu, K.-L. Chiu, Chia-Shiung Tsai, Chung-Yi Yu, S.-P. Wang, G. P. Lansbergen, Chiang Chen-Hao
المصدر: 2015 IEEE International Electron Devices Meeting (IEDM).
بيانات النشر: IEEE, 2015.
سنة النشر: 2015
مصطلحات موضوعية: Materials science, business.industry, Transistor, Schottky diode, Gallium nitride, Capacitance, law.invention, chemistry.chemical_compound, chemistry, law, Logic gate, Optoelectronics, business, MISFET, AND gate, Leakage (electronics)
الوصف: CMOS-compatible 100 V / 650 V enhancement-mode high electron mobility transistors (E-HEMTs) and 650 V depletion-mode MISFET (D-MISFET) are fabricated on 6-inch GaN-on-Si wafers. These devices show excellent power converter switching performances. Both 100 V and 650 V E-HEMTs had passed industrial reliability qualifications. The importance of bulk leakage, interface quality and gate trapping in dynamic on-resistance is figured out. The device with optimized processes shows a significant reduction of the dynamic on-resistance degradation.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b7faa0d215059670d3d4fc905d6e081b
https://doi.org/10.1109/iedm.2015.7409663
رقم الأكسشن: edsair.doi...........b7faa0d215059670d3d4fc905d6e081b
قاعدة البيانات: OpenAIRE