New Observation of NBTI Degradation and Recovery Effect of Plasma Nitrided Oxide in Nano Scale PMOSFET’s

التفاصيل البيبلوغرافية
العنوان: New Observation of NBTI Degradation and Recovery Effect of Plasma Nitrided Oxide in Nano Scale PMOSFET’s
المؤلفون: Won-Ho Choi, Min-Ki Na, Tae-Gyu Goo, Dae-Byung Kim, Hee-Hwan Ji, Yong-Goo Kim, Hi-Deok Lee, Young-Seok Kang, Ga-Won Lee, Heui-Seung Lee, Ook-Sang You, In-Shik Han, Sung-Hyung Park
المصدر: Extended Abstracts of the 2007 International Conference on Solid State Devices and Materials.
بيانات النشر: The Japan Society of Applied Physics, 2007.
سنة النشر: 2007
مصطلحات موضوعية: chemistry.chemical_compound, Recovery effect, Materials science, Chemical engineering, chemistry, Oxide, Degradation (geology), Plasma, Nanoscopic scale, Nitriding
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::bbcad02fada2fce9f9e32d88c145e480
https://doi.org/10.7567/ssdm.2007.p-3-14
رقم الأكسشن: edsair.doi...........bbcad02fada2fce9f9e32d88c145e480
قاعدة البيانات: OpenAIRE