Low-temperature fabrication of p/sup +/-n diodes with 300-AA junction depth

التفاصيل البيبلوغرافية
العنوان: Low-temperature fabrication of p/sup +/-n diodes with 300-AA junction depth
المؤلفون: P.G. Carey, A. M. McCarthy, Kurt H. Weiner, T. W. Sigmon
المصدر: IEEE Electron Device Letters. 13:369-371
بيانات النشر: Institute of Electrical and Electronics Engineers (IEEE), 1992.
سنة النشر: 1992
مصطلحات موضوعية: Materials science, Gas laser, business.industry, Doping, Analytical chemistry, Biasing, Semiconductor device, Electronic, Optical and Magnetic Materials, Gas immersion laser doping, law.invention, Reverse leakage current, law, Optoelectronics, Electrical and Electronic Engineering, p–n junction, business, Diode
الوصف: Gas immersion laser doping (GILD) was used to fabricate p/sup +/-n diodes with 300-AA junction depth. These diodes exhibit ideality factors of 1.01-1.05 over seven decades of current, reverse leakage current densities >
تدمد: 1558-0563
0741-3106
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c0284df1bd4cc269758cd8a825c5d583
https://doi.org/10.1109/55.192758
حقوق: CLOSED
رقم الأكسشن: edsair.doi...........c0284df1bd4cc269758cd8a825c5d583
قاعدة البيانات: OpenAIRE