Fabrication of metal nano-wires by laser interference lithography using a tri-layer resist process
| العنوان: | Fabrication of metal nano-wires by laser interference lithography using a tri-layer resist process |
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| المؤلفون: | Yutao Fang, H. S. Chen, Gen Yue, Fan Yang, Longgui Dai, Peng Zuo |
| المصدر: | Optical and Quantum Electronics. 48 |
| بيانات النشر: | Springer Science and Business Media LLC, 2015. |
| سنة النشر: | 2015 |
| مصطلحات موضوعية: | 010302 applied physics, Materials science, Nanotechnology, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, law.invention, Resist, law, 0103 physical sciences, X-ray lithography, Stencil lithography, Electrical and Electronic Engineering, Photolithography, 0210 nano-technology, Lithography, Electron-beam lithography, Maskless lithography, Next-generation lithography |
| الوصف: | This article presents a general method for fabrication of large-area metal nano-wires using laser interference lithography and a lift-off process. A tri-layer resist structure consisting of a thin top photoresist, a metal inter-layer and a thick bottom photoresist is introduced to fabricate thick photoresist nano-patterns. Laser interference lithography is used to pattern the top thin photoresist and the lift-off process is applied to acquire nano-patterns with high duty cycle. Thick photoresist nano-patterns with high duty cycle are fabricated by the reactive ion etching process. Using the thick photoresist nano-patterns, metal nano-wires with a 100 nm square cross-section are successfully fabricated by a lift-off process. The method presented in this article can produce large-area metal nano-wires with high-throughput and low cost, as compared with the traditional method using electron beam lithography. Moreover, laser interface lithography is a maskless lithography method and can fabricate nano-patterns with high uniformity and good period controllability, which makes this method a promising way to manufacture metal nano-wires devices. |
| تدمد: | 1572-817X 0306-8919 |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_________::c38d173b9d9e27ad7f89897bc43cc375 https://doi.org/10.1007/s11082-015-0286-z |
| حقوق: | CLOSED |
| رقم الأكسشن: | edsair.doi...........c38d173b9d9e27ad7f89897bc43cc375 |
| قاعدة البيانات: | OpenAIRE |
Find this article in full text from Springer Verlag. | تدمد: | 1572817X 03068919 |
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