Synchrotron X-ray Photoelectron Spectroscopy Study of Electronic Changes at the ZnO Surface Following Aryldiazonium Ion Grafting: A Metal-to-Insulator Transition
العنوان: | Synchrotron X-ray Photoelectron Spectroscopy Study of Electronic Changes at the ZnO Surface Following Aryldiazonium Ion Grafting: A Metal-to-Insulator Transition |
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المؤلفون: | Alison J. Downard, Rodrigo M. Gazoni, Martin W. Allen, Roger J. Reeves, Kalib J. Bell, Adam R. Hyndman, Alexandra R. McNeill |
المصدر: | The Journal of Physical Chemistry C. 122:12681-12693 |
بيانات النشر: | American Chemical Society (ACS), 2018. |
سنة النشر: | 2018 |
مصطلحات موضوعية: | Materials science, business.industry, 02 engineering and technology, 010402 general chemistry, 021001 nanoscience & nanotechnology, Electrochemistry, 01 natural sciences, Synchrotron, 0104 chemical sciences, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, law.invention, Ion, Crystallography, General Energy, Semiconductor, Band bending, Adsorption, X-ray photoelectron spectroscopy, Covalent bond, law, Physical and Theoretical Chemistry, 0210 nano-technology, business |
الوصف: | ZnO is a member of a small class of semiconductors that includes In2O3, SnO2, CdO, and InN, whose surfaces are highly unusual because their electronic bands bend downward to form a quantized potential well in which a two-dimensional electron gas is confined. At the O-polar ZnO(0001) surface, this effect arises from the adsorption of H adatoms which produces a hydroxyl-terminated surface. In this work, we investigate the effect of covalently anchored organic layers on the band bending at ZnO(0001) surfaces. We use aryldiazonium salt electrochemistry to deposit 4–5 nm thick layers of 4-nitrophenyl (NP) and 4-(trifluoromethyl)phenyl (TFMP) groups. Synchrotron X-ray photoelectron spectroscopy (XPS) showed that both NP and TFMP modifications permanently removed the downward band bending at the ZnO surface. This behavior can be explained by the direct covalent bonding of the aryl groups to the surface, also revealed by XPS analysis, and the electron-withdrawing character of both modifiers. Surprisingly, the i... |
تدمد: | 1932-7455 1932-7447 |
URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_________::c45b53fe777f90aea4284668afb30d10 https://doi.org/10.1021/acs.jpcc.8b00758 |
رقم الأكسشن: | edsair.doi...........c45b53fe777f90aea4284668afb30d10 |
قاعدة البيانات: | OpenAIRE |
تدمد: | 19327455 19327447 |
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