Fast all-angle Mask 3D for ILT patterning

التفاصيل البيبلوغرافية
العنوان: Fast all-angle Mask 3D for ILT patterning
المؤلفون: P. Jeffrey Ungar, Leo Pang, Henry Yu, Aki Fujimura, Mike Meyer, Ryan Pearman
المصدر: Optical Microlithography XXXIII.
بيانات النشر: SPIE, 2020.
سنة النشر: 2020
مصطلحات موضوعية: Curvilinear coordinates, Computer science, business.industry, Computer vision, Process window, Artificial intelligence, business, Grayscale, Aerial image, Continuous tone
الوصف: Typical ILT goes through a continuous tone mask to define a greyscale mask for the best process window, followed by a conversion into actual mask geometries, which are typically Manahttanized to be compatible with printing on existing mask writers. On mask, however, the features to be printed are not Manhattan, and we demonstrate that, by not taking into account the actual mask shapes, current Manhattan mask 3D (M3D) approximations using width, shape, and corner libraries, give rise to poor predictions for the final aerial image. Now that curvilinear ILT is possible to manufacture, we introduce a fully curvilinear mask 3D approximations, compatible with ILT masks, that predict the aerial image significantly better than before.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ce74430aad97b156a712a323b4a9317c
https://doi.org/10.1117/12.2554856
رقم الأكسشن: edsair.doi...........ce74430aad97b156a712a323b4a9317c
قاعدة البيانات: OpenAIRE