P-75: Advanced Halftone Photolithography Using Four-Mask Process Architecture for G8.6 TFT-LCDs

التفاصيل البيبلوغرافية
العنوان: P-75: Advanced Halftone Photolithography Using Four-Mask Process Architecture for G8.6 TFT-LCDs
المؤلفون: An-Thung Cho, James Hsu, Jeff Zhou, Jinn Hong, Feng-yun Yang, Yan-mei Luo, Yi-qun Tian, Dan Lei, Zhen Liu, Qiong-hua Mo, Kai-jun Liu, Bang-tong Ge, Feng-xiang Long, Ting-ting Fu, Min Li, Wade Chen, York Lu
المصدر: SID Symposium Digest of Technical Papers. 49:1471-1474
بيانات النشر: Wiley, 2018.
سنة النشر: 2018
مصطلحات موضوعية: 010302 applied physics, 0103 physical sciences, 02 engineering and technology, 021001 nanoscience & nanotechnology, 0210 nano-technology, 01 natural sciences
تدمد: 0097-966X
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e594d3a35adc30a4d7156b77ad022007
https://doi.org/10.1002/sdtp.12240
حقوق: CLOSED
رقم الأكسشن: edsair.doi...........e594d3a35adc30a4d7156b77ad022007
قاعدة البيانات: OpenAIRE