Stress management for 3D through-silicon-via stacking technologies - The next frontier

التفاصيل البيبلوغرافية
العنوان: Stress management for 3D through-silicon-via stacking technologies - The next frontier
المؤلفون: Matt Nowak, Riko Radojcic, Mark Nakamoto
المصدر: AIP Conference Proceedings.
بيانات النشر: AIP Publishing LLC, 2014.
سنة النشر: 2014
مصطلحات موضوعية: Engineering, Through-silicon via, business.industry, Design flow, Process design, Integrated circuit, law.invention, Set (abstract data type), Reliability (semiconductor), law, Systems engineering, Electronic engineering, Product (category theory), business, Abstraction (linguistics)
الوصف: The status of the development of a Design-for-Stress simulation flow that captures the stress effects in packaged 3D-stacked Si products like integrated circuits (ICs) using advanced via-middle Through Si Via technology is outlined. The next set of challenges required to proliferate the methodology and to deploy it for making and dispositioning real Si product decisions are described here. These include the adoption and support of a Process Design Kit (PDK) that includes the relevant material properties, the development of stress simulation methodologies that operate at higher levels of abstraction in a design flow, and the development and adoption of suitable models required to make real product reliability decisions.
تدمد: 0094-243X
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e9e09aad36908e40cf8749453687105c
https://doi.org/10.1063/1.4881338
رقم الأكسشن: edsair.doi...........e9e09aad36908e40cf8749453687105c
قاعدة البيانات: OpenAIRE