Aberration-Corrected TEM Study of Defects in III-V Films Grown on Si
| العنوان: | Aberration-Corrected TEM Study of Defects in III-V Films Grown on Si |
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| المؤلفون: | Gianluigi A. Botton, S Tavakoli, Shahrzad Hosseini Vajargah, Rafael N. Kleiman, Martin Couillard, Yang Shao, John S. Preston |
| المصدر: | Microscopy and Microanalysis. 16:1338-1339 |
| بيانات النشر: | Oxford University Press (OUP), 2010. |
| سنة النشر: | 2010 |
| مصطلحات موضوعية: | Materials science, Analytical chemistry, Instrumentation |
| الوصف: | Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010. |
| تدمد: | 1435-8115 1431-9276 |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_________::ebdb002ba6ddd77659eb4f1cbe2ac7e5 https://doi.org/10.1017/s1431927610062033 |
| حقوق: | OPEN |
| رقم الأكسشن: | edsair.doi...........ebdb002ba6ddd77659eb4f1cbe2ac7e5 |
| قاعدة البيانات: | OpenAIRE |
| تدمد: | 14358115 14319276 |
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