Quantum well intermixing for the fabrication of InGaAsN/GaAs lasers with pulsed anodic oxidation

التفاصيل البيبلوغرافية
العنوان: Quantum well intermixing for the fabrication of InGaAsN/GaAs lasers with pulsed anodic oxidation
المؤلفون: M. H. Hong, Michael C. Y. Chan, S. Z. Wang, S. F. Yoon, Shu Yuan, Chang Liu, Y. Qu
المصدر: Journal of Applied Physics. 95:3422-3426
بيانات النشر: AIP Publishing, 2004.
سنة النشر: 2004
مصطلحات موضوعية: Materials science, Photoluminescence, business.industry, Annealing (metallurgy), General Physics and Astronomy, Epitaxy, Blueshift, Gallium arsenide, chemistry.chemical_compound, Laser linewidth, chemistry, Optoelectronics, business, Luminescence, Quantum well
الوصف: Quantum well (QW) intermixing was carried out by post-growth rapid thermal annealing in InGaAsN/GaAs QW laser structures grown by solid-source molecular-beam epitaxy. The intensity and width of the photoluminescence peak showed a dependence on annealing temperature and time, and the maximum intensity and minimum linewidth were obtained after the wafer was annealed at 670 °C for 60 s. The peak luminescence energy blueshifted with increasing annealing time, although it plateaued at an annealing time that corresponded to that yielding the maximum luminescence intensity. The diffusion coefficient for indium was determined from a comparison between experimental data and modeling, but showed that QW intermixing alone was not sufficient to account for the relatively large blueshift after annealing. Defects related to the incorporation of nitrogen in the QW layer were responsible for the low photoluminescence efficiency in the as-grown samples and were annealed out during rapid thermal annealing. During annealing...
تدمد: 1089-7550
0021-8979
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fa92871a0796d42467920841f706ac36
https://doi.org/10.1063/1.1651322
حقوق: OPEN
رقم الأكسشن: edsair.doi...........fa92871a0796d42467920841f706ac36
قاعدة البيانات: OpenAIRE