Influence of deposition temperature on the structural and morphological properties of Be3N2 thin films grown by reactive laser ablation

التفاصيل البيبلوغرافية
العنوان: Influence of deposition temperature on the structural and morphological properties of Be3N2 thin films grown by reactive laser ablation
المؤلفون: F. Chalé-Lara, W. de la Cruz, M. Zapata-Torres, Mario H. Farías
المصدر: Applied Surface Science. 256:7628-7631
بيانات النشر: Elsevier BV, 2010.
سنة النشر: 2010
مصطلحات موضوعية: Laser ablation, Materials science, Silicon, Scanning electron microscope, Annealing (metallurgy), Whiskers, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, Surfaces and Interfaces, General Chemistry, Condensed Matter Physics, Beryllium nitride, Surfaces, Coatings and Films, Pulsed laser deposition, chemistry.chemical_compound, chemistry, Thin film
الوصف: Be3N2 thin films have been grown on Si(1 1 1) substrates using the pulsed laser deposition method at different substrate temperatures: room temperature (RT), 200 ◦ C, 400 ◦ C, 600 ◦ C and 700 ◦
تدمد: 0169-4332
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fd9ed9bd5bf46a00008c20a76569135f
https://doi.org/10.1016/j.apsusc.2010.06.017
حقوق: CLOSED
رقم الأكسشن: edsair.doi...........fd9ed9bd5bf46a00008c20a76569135f
قاعدة البيانات: OpenAIRE