2D MoS2 Encapsulated Silicon Nanopillar Array with High-Performance Light Trapping Obtained by Direct CVD Process

التفاصيل البيبلوغرافية
العنوان: 2D MoS2 Encapsulated Silicon Nanopillar Array with High-Performance Light Trapping Obtained by Direct CVD Process
المؤلفون: Shuai Wen, Peiru Zhang, Zhuoman Wang, Fei Xie, Minyu Bai, Huan Liu, Jijie Zhao
المصدر: Crystals
Volume 11
Issue 3
Crystals, Vol 11, Iss 267, p 267 (2021)
بيانات النشر: Multidisciplinary Digital Publishing Institute, 2021.
سنة النشر: 2021
مصطلحات موضوعية: Materials science, Silicon, General Chemical Engineering, chemistry.chemical_element, 02 engineering and technology, Substrate (electronics), Chemical vapor deposition, 010402 general chemistry, 01 natural sciences, Inorganic Chemistry, lcsh:QD901-999, Transmittance, Deposition (phase transition), General Materials Science, Absorption (electromagnetic radiation), Nanopillar, business.industry, 021001 nanoscience & nanotechnology, Condensed Matter Physics, CVD, Ray, 0104 chemical sciences, chemistry, nano pillar array substrate, Optoelectronics, encapsulation, lcsh:Crystallography, 0210 nano-technology, business, absorption, 2D MoS2
الوصف: Weak absorption remains a vital factor that limits the application of two-dimensional (2D) materials due to the atomic thickness of those materials. In this work, a direct chemical vapor deposition (CVD) process was applied to achieve 2D MoS2 encapsulation onto the silicon nanopillar array substrate (NPAS). Single-layer 2D MoS2 monocrystal sheets were obtained, and the percentage of the encapsulated surface of NPAS was up to 80%. The reflection and transmittance of incident light of our 2D MoS2-encapsulated silicon substrate within visible to shortwave infrared were significantly reduced compared with the counterpart planar silicon substrate, leading to effective light trapping in NPAS. The proposed method provides a method of conformal deposition upon NPAS that combines the advantages of both 2D MoS2 and its substrate. Furthermore, the method is feasible and low-cost, providing a promising process for high-performance optoelectronic device development.
وصف الملف: application/pdf
اللغة: English
تدمد: 2073-4352
DOI: 10.3390/cryst11030267
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::66a8487e93f922bfd10906840ee5a4b8
حقوق: OPEN
رقم الأكسشن: edsair.doi.dedup.....66a8487e93f922bfd10906840ee5a4b8
قاعدة البيانات: OpenAIRE
الوصف
تدمد:20734352
DOI:10.3390/cryst11030267