Remote Oxygen Scavenging of the Interfacial Oxide Layer in Ferroelectric Hafnium–Zirconium Oxide-Based Metal–Oxide–Semiconductor Structures
| العنوان: | Remote Oxygen Scavenging of the Interfacial Oxide Layer in Ferroelectric Hafnium–Zirconium Oxide-Based Metal–Oxide–Semiconductor Structures |
|---|---|
| المؤلفون: | Nujhat Tasneem, Harshil Kashyap, Kisung Chae, Chinsung Park, Ping-che Lee, Sarah F Lombardo, Nashrah Afroze, Mengkun Tian, Harish Kumarasubramanian, Jae Hur, Hang Chen, Winston Chern, Shimeng Yu, Prabhakar Bandaru, Jayakanth Ravichandran, Kyeongjae Cho, Josh Kacher, Andrew C. Kummel, Asif Islam Khan |
| المصدر: | ACS Applied Materials & Interfaces. 14:43897-43906 |
| بيانات النشر: | American Chemical Society (ACS), 2022. |
| سنة النشر: | 2022 |
| مصطلحات موضوعية: | General Materials Science |
| الوصف: | Discovery of ferroelectricity in HfO |
| تدمد: | 1944-8252 1944-8244 |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a324e2945840f490ca258809f213e785 https://doi.org/10.1021/acsami.2c11736 |
| حقوق: | CLOSED |
| رقم الأكسشن: | edsair.doi.dedup.....a324e2945840f490ca258809f213e785 |
| قاعدة البيانات: | OpenAIRE |
Find this issue from the American Chemical Society | تدمد: | 19448252 19448244 |
|---|