In-situ Ar plasma treatment as a low thermal budget technique for high performance InGaSnO thin film transistors fabricated using magnetron sputtering

التفاصيل البيبلوغرافية
العنوان: In-situ Ar plasma treatment as a low thermal budget technique for high performance InGaSnO thin film transistors fabricated using magnetron sputtering
المؤلفون: Mengzhen Hu, Lei Xu, Xinnan Zhang, Zengcai Song, Shijun Luo
المصدر: Applied Surface Science. 604:154621
بيانات النشر: Elsevier BV, 2022.
سنة النشر: 2022
مصطلحات موضوعية: History, Polymers and Plastics, General Physics and Astronomy, Surfaces and Interfaces, General Chemistry, Business and International Management, Condensed Matter Physics, Industrial and Manufacturing Engineering, Surfaces, Coatings and Films
تدمد: 0169-4332
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ba7499285a3995b9136556ee713d1c76
https://doi.org/10.1016/j.apsusc.2022.154621
حقوق: CLOSED
رقم الأكسشن: edsair.doi.dedup.....ba7499285a3995b9136556ee713d1c76
قاعدة البيانات: OpenAIRE