Effect of Low-Pressure Plasma Nitriding with Hollow Cathode Discharge on the Surface Microstructure of WC-Co Cermet
| العنوان: | Effect of Low-Pressure Plasma Nitriding with Hollow Cathode Discharge on the Surface Microstructure of WC-Co Cermet |
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| المؤلفون: | Weiqiu Li, Jiwei Zeng, Jihua Peng, Yang Xiao, Yinglong Peng |
| المصدر: | Coatings, Vol 11, Iss 1149, p 1149 (2021) Coatings Volume 11 Issue 10 |
| بيانات النشر: | MDPI AG, 2021. |
| سنة النشر: | 2021 |
| مصطلحات موضوعية: | Materials science, microstructure, low-pressure plasma nitriding, Surfaces and Interfaces, Chemical vapor deposition, Cermet, Microstructure, Engineering (General). Civil engineering (General), Isotropic etching, Ion source, Surfaces, Coatings and Films, hollow cathode discharge, hot filament chemical vapor deposition Co compounds, X-ray photoelectron spectroscopy, Chemical engineering, WC-Co cermet, Materials Chemistry, TA1-2040, Layer (electronics), Nitriding |
| الوصف: | WC-Co cermet was plasma-nitrided with the assistance of a hollow cathode ion source at 400 °C under a vacuum of 3–8 Pa. Hot film chemical vapor deposition (HFCVD) of a diamond coating was carried out on the nitrided specimen, without chemical etching. Scanning electronic microscopy, electron probing microscopy, X-ray diffraction, and X-ray photoelectron spectroscopy were used to characterize the surface microstructure of the nitride specimens and the coatings. A thin surface conversion layer with a specific structure was formed, in which the primary Co binder was transformed into Co-rich particles. The Co-rich particles consisted of a γ-Co core and a Co4N outer layer. This specific surface conversion layer significantly suppresses the out-diffusion and catalytic graphitization of Co during HFCVD. The existent phase, morphology, and density distribution of Co compounds can be tuned by varying the nitriding parameters, such as gas media, ionization ratio, bombardment energy flux, and nitriding duration. |
| وصف الملف: | application/pdf |
| اللغة: | English |
| تدمد: | 2079-6412 |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e7cf474a937aab0d9ef3d9222e5fc1d4 https://www.mdpi.com/2079-6412/11/10/1149 |
| حقوق: | OPEN |
| رقم الأكسشن: | edsair.doi.dedup.....e7cf474a937aab0d9ef3d9222e5fc1d4 |
| قاعدة البيانات: | OpenAIRE |
| تدمد: | 20796412 |
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