Modification of the Cu-ETP copper surface layer with chromium by physical vapor deposition (PvD) and diffusion annealing
| العنوان: | Modification of the Cu-ETP copper surface layer with chromium by physical vapor deposition (PvD) and diffusion annealing |
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| المؤلفون: | Poreba, M., Pytel, M., Drajewicz, M., Ziaja, W., Góral, M. |
| المصدر: | Metalurgija Volume 61 Issue 3-4 |
| بيانات النشر: | Croatian Metallurgical Society (CMS), 2022. |
| سنة النشر: | 2022 |
| مصطلحات موضوعية: | Cu-ETP and Cu-OF copper, surface, CuCr layer, PVD, annealing, x-ray analysis, scanning electron microscopy (SEM), energy dispresive spectroscopy (EDS) |
| الوصف: | In the study, an attempt was made to increase durability of copper by creating a surface layer saturated or supersaturated with chromium only in the area of the highest thermo-mechanical loads during the welding process. There was developed a two-stage technological process, consisting of: application of chrome coating of the thickness approx. 1 µm on the Cu-ETP copper surface using the PVD method, and then performing the process of its diffusion by annealing at a temperature of 950°C in the vacuum. As a result, a diffusion CuCr layer with a thickness of approx. 20 µm was obtained, with hardness of approx. 120 HV0,01. |
| وصف الملف: | application/pdf |
| اللغة: | English |
| تدمد: | 1334-2576 0543-5846 |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=od_______951::ab7ba5944d7d4023b4b53e1793da6b31 https://hrcak.srce.hr/file/396884 |
| حقوق: | OPEN |
| رقم الأكسشن: | edsair.od.......951..ab7ba5944d7d4023b4b53e1793da6b31 |
| قاعدة البيانات: | OpenAIRE |
| تدمد: | 13342576 05435846 |
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