Low-Power 6T SRAM Cell using 22nm CMOS Technology

التفاصيل البيبلوغرافية
العنوان: Low-Power 6T SRAM Cell using 22nm CMOS Technology
المؤلفون: Nibha Kumari, Prof. Vandana Niranjan
المساهمون: Nibha Kumari
بيانات النشر: Zenodo, 2022.
سنة النشر: 2022
مصطلحات موضوعية: SRAM, Metal Gate/ High-k/ Strained-Si, Metal Gate/ High-k, Power Consumption
الوصف: Static Random-Access Memory (SRAM) occupies approximately 90% of total area on a chip due to high number of transistors used for a single SRAM cell. Therefore, SRAM cell becomes a power-hungry block on a chip and it becomes more prominent at lower technologies from both dynamic and static perspective. Static power consumption is due to leakage current associated with the transistors that are off and dynamic power consumption is due to charging and discharging of the circuit capacitance. As gate length or channel length decreases gate oxide thickness also scales down. Scaling down of conventional transistor results in huge tunneling of electron from gate into channel leading to higher leakage power consumption. So, transistor with metal gate, high-k dielectric and strained-Si is used which shows better result in terms of low-power consumption, better performance with acceptable delay. Among various topologies of SRAM cell 6T is considered as a suitable choice for low power applications.
اللغة: English
URL الوصول: https://explore.openaire.eu/search/publication?articleId=od______2659::10146bf47b6bb9705fabb7890464db8c
https://zenodo.org/record/7976691
حقوق: OPEN
رقم الأكسشن: edsair.od......2659..10146bf47b6bb9705fabb7890464db8c
قاعدة البيانات: OpenAIRE