Optical characterization of dislocation free Ge and GeOI wafers

التفاصيل البيبلوغرافية
العنوان: Optical characterization of dislocation free Ge and GeOI wafers
المؤلفون: Kalem, S., Romandic, I., Theuwis, A.
المصدر: Thin Solid Films 518, 2377(2010)
سنة النشر: 2015
المجموعة: Condensed Matter
مصطلحات موضوعية: Condensed Matter - Mesoscale and Nanoscale Physics
الوصف: Optical properties of dislocations free state-of-the-art Germanium(Ge) and Germanium-oninsulator(GeOI) wafers have been characterized using Fourier transformed infrared spectroscopy at oblique incidence, attenuated total reflectance, laser Raman scattering, linear and nonlinear optical transmission. In n-type Ge, in addition to vibrational modes observed in intrinsic(i) Ge, a band at 535cm-1 which is likely due to carbon and a strong peak at 668 cm-1 were observed at non-normal incidence. Despite the strong heavy hole to light hole absorption band at low energies, the 668 cm-1 peak was also observed in p-Ge. The appearance of new bands and the enhancement in band strength are in general observed in both type of wafers at oblique incidence. GeOI exhibits a strong disorder induced LO-TO coupling mode which can only be observed at non-normal incidence. Optical absorption at the near bang edge reveals the presence of doping related disorder and band shrinkage, which is supported also by Ge-Ge one-phonon line broadening at 301 cm-1. Different nonlinear optical absorption behavior was observed in n-Ge, p-Ge and GeOI wafers. The p-Ge becomes transparent to CO2 laser line at 10.6 micrometer, while transmitted power decreases in n-Ge with increasing UV-VIS pump power.
نوع الوثيقة: Working Paper
DOI: 10.1016/j.tsf.2009.09.137
URL الوصول: http://arxiv.org/abs/1512.08005
رقم الأكسشن: edsarx.1512.08005
قاعدة البيانات: arXiv
الوصف
DOI:10.1016/j.tsf.2009.09.137