Strain in Epitaxial High-Index Bi2Se3(221) Films Grown by Molecular-Beam Epitaxy

التفاصيل البيبلوغرافية
العنوان: Strain in Epitaxial High-Index Bi2Se3(221) Films Grown by Molecular-Beam Epitaxy
المؤلفون: Li, B., Chen, W. G., Guo, X., Ho, W. K., Dai, X. Q., Jia, J. F., Xie, M. H.
سنة النشر: 2016
المجموعة: Condensed Matter
مصطلحات موضوعية: Condensed Matter - Materials Science
الوصف: High-index Bi2Se3(221) film has been grown on In2Se3-buffered GaAs(001), in which a much retarded strain relaxation dynamics is recorded. The slow strain-relaxation process of in epitaxial Bi2Se3(221) can be attributed to the layered structure of Bi2Se3 crystal, where the epifilm grown along [221] is like a pile of weakly-coupled quintuple layer slabs stacked side-by-side on substrate. Finally, we have revealed the strong chemical bonding at the interface of Bi2Se3 and In2Se3 by plotting differential charge contour calculated by first-principle method. This study points to the feasibility of achieving strained TIs for manipulating the properties of topological systems.
نوع الوثيقة: Working Paper
DOI: 10.1016/j.apsusc.2016.11.189
URL الوصول: http://arxiv.org/abs/1606.06227
رقم الأكسشن: edsarx.1606.06227
قاعدة البيانات: arXiv
الوصف
DOI:10.1016/j.apsusc.2016.11.189